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Analizador de gases con láser de diodo sintonizable (TDL) in situ LGA-4100

Utilizing proprietary technologies of Tunable Diode Laser Absorption Spectroscopy (TDLAS), FPI delivers the LGA system to satisfy in-situ mesurements with high accuracy, fast response, strong reliability and virtually maintenance free.

FPI LGA system is applicable to almost all industrial process, especially well proven in harsh conditions in combination of high temperature, pressure, dust, corrosives and contaminants.

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Based on the Tunable Diode Laser (TDL) technology, LGA-4000 is a highly reliable laser gas analysis system that monitors various toxic and hazardous substances (HF, NH₃, H₂S, HCI) from stack emission with high accuracy, strong reliability and is virtually maintenance-free.

Leveraging an installed base of over 8,000 units, the LGA system has been extensively used for combustion and safety control, process optimization, energy recovery, scientific research as well as environment monitoring. To date, these units have been employed in metallurgy, refinery, petrochemical, natural gas, power plant, waste incineration, cement and other situations where gas measurement is needed.

Principio

TDLAS technology utilizes the principle that laser en-ergy is absorbed selectively by gas to form an absorption spectrum. Laser beams of specific wavelengthsis emitted by semiconductor laser, and when passesthrough the gas, the attenuation of the laser intensityis related with measured gas. The concentration canbe obtained by measuring intensity attenuation.

Analizador de gases con láser de diodo sintonizable (TDL) in situ LGA-4100 Especificaciones técnicas

Componentes	O₂, CO, CO₂, H₂O, H₂S, HF, HCl, HCN, NH₃, CH₄, C₂H₆, C₂H₄, CH₃I
Precisión	HF: 0.02ppm; HCl, NH₃, C₂H₂: 0.1ppm; H₂O, HCN: 0.3ppm; CH₄: 0.4ppm; C₂H₆, CH₃I: 0.6ppm; CO, CO₂: 10ppm; H₂S: 20ppm; O₂: 100ppm, at room temperature and pressure with reference to a one-meter optical range.
Gama	HF: (0~5)ppm; C₂H₆, NH₃: (0~10)ppm; HCN: (0~30)ppm; CH₄: (0~40)ppm; HCl, H₂O: (0~50)ppm; C₂H₆, CH₃I: (0~60)ppm; CO, CO₂: (0~1000)ppm; H₂S: (0~2000)ppm; O₂: (0~1)%Vol, customized.
Linealidad	≤±1%F.S.
Deriva de la amplitud	≤±1%F.S./6 months
Tiempo de respuesta	≤1s
Preheating Time	≤15min
Temperatura de trabajo	-30~60°C
Storage Temperature	-40~80°C
Purge Gas	Instrument air, industrial N₂: (0.3~0.8)Mpa
Enclosing Rate	IP65
Explosion–Proof	Ex d IIC T5
Fuente de alimentación	24V DC, 220V AC is optional
Consumption	≤20W
Analog Outputs	2 way 4~20mA
Relay Outputs	3 way 24V DC/1A

Aplicaciones versátiles en todos los sectores

HCl, HF in waste incineration.

NH3 and HF monitoring in fertilizer plant.

HCl in pharma industry.

NH3 slip in thermal power plant SCR, SNCR.

Características principales de Analizador de gases con láser de diodo sintonizable (TDL) in situ LGA-4100

In-situ, no gas sampling.
No cross interference.
A fast response less than one second.
Diverse optical length (0.5~20m).
Reliable in all harsh conditions: high temperature & pressure, dust density, moisture, and corrosion.
Online calibration, no zero drift.
Thousands of tailor-made solutions for various applications.
International ATEX certified.

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