Designed for advanced wafer manufacturing, high-purity materials and other high-end industrial applications, the EXPEC 7350S Plus combines sub-ppt detection capability, automated workflow compatibility and application-focused system design to support tighter contamination control and greater analytical efficiency.
FPI announced the launch of the EXPEC 7350S Plus Series Triple Quadrupole Inductively Coupled Plasma Mass Spectrometer (ICP-MS/MS). Built on the company’s established ICP-MS platform and specifically enhanced for semiconductor and high-end manufacturing workflows, the system delivers sub-ppt ultra-trace metal detection capability and supports critical applications such as surface metal ion analysis associated with advanced 12-inch wafer processes.
Why Is Ultra-Trace Metal Analysis So Important in Semiconductor Manufacturing?
As semiconductor manufacturing continues to move toward more advanced process nodes, tolerance for metallic impurities is becoming increasingly limited. Even extremely low levels of residual metal contamination can affect process stability, device performance and overall yield. Analytical capability for surface metal ions, high-purity chemicals and other critical materials is therefore becoming an essential part of advanced manufacturing infrastructure.
Why Choose the EXPEC 7350S Plus for Ultra-Trace Semiconductor Analysis?
For ultra-trace semiconductor analysis, instrument value is defined not only by detection limits, but also by system stability, workflow compatibility and the ability to support critical applications. Built on a proven ICP-MS platform and optimized for advanced manufacturing environments, the EXPEC 7350S Plus brings together sensitivity, automation compatibility, system safety and application support in a more balanced system design, helping laboratories and production environments meet rising expectations for ultra-trace metal analysis.
Higher Sensitivity for More Demanding Detection Requirements
Equipped with a self-developed multi-bend ion transmission system, dual extraction lenses and a next-generation ion interface, the EXPEC 7350S Plus achieves sub-ppt detection limits. For laboratories monitoring and controlling ultra-trace metallic contamination, this provides a competitive level of analytical capability for advanced semiconductor applications where sensitivity is critical.
Designed for Automated Workflows
In semiconductor environments, analytical performance alone is not enough; workflow integration also matters. The EXPEC 7350S Plus supports integrated coupling with fully automated VPD systems and can be configured for 8-inch and 12-inch wafers as well as multiple substrate materials, including silicon and silicon carbide. By enabling automation from sampling and pretreatment through analysis and reporting, the system helps reduce manual variability, improve throughput and better align with the consistency and efficiency requirements of production-scale operations.
System Safety and Operational Stability Are Built into the Design
The EXPEC 7350S Plus incorporates internally developed architecture across key components and software systems and includes an intelligent water and gas leak alarm system for real-time monitoring and automatic protection under abnormal conditions. In critical analytical environments that demand long-term operational stability, these features help strengthen instrument safety, laboratory safety and data security.
What Applications Does the EXPEC 7350S Plus Support?
In addition to surface metal ion analysis for advanced 12-inch wafers, the EXPEC 7350S Plus is designed for applications including silicon carbide wafer analysis, ultra-pure wet electronic chemical analysis, electronic specialty gas analysis and purity analysis of high-purity metal sputtering targets. It is also suited to other industrial testing tasks that require ultra-trace elemental analysis.
As semiconductor and high-end manufacturing industries continue to raise expectations for process control and material purity, the role of analytical instrumentation is evolving. These systems are no longer only laboratory tools; they are becoming an essential part of advanced manufacturing capability. The EXPEC 7350S Plus reflects progress not only in detection sensitivity, but also in system integration, automation readiness and support for critical applications.
FPI will continue to invest in advanced analytical technologies and build on its ICP-MS expertise and industrial experience to deliver reliable and efficient analytical solutions for semiconductor, high-purity materials and other high-end manufacturing industries.
